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UV-Ozone surface cleaner
It is often critically important to clean the substrates to a molecular level before device fab-rication. Conventional cleaning techniques often leave a monolayer of organics on the sur-face, which is detrimental in device performance. The ultraviolet (UV)/ozone cleaning is a simple-to-use, inexpensive, fast and dry method that rapidly removes organic contaminants including oils and greases, fluxes, skin oils, and contamination adsorbed during prolonged exposure to air. Contact angle measurements and wettability tests confirm the performance of this method. In this method samples are exposed to a certain dose of simultaneous UV/ozone, at optimum and controlled conditions. The exposure time is set by a timer and oxygen can be injected for improved performance.
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